A random walk model for the crystallite size effect on the secondary electron yield from insulators

Thin Solid Films

Volumn 434, Issue 1-2, 2003, Pages 303-310

  Cazaux, Jacques ^a  

^a UNIVERSITÉ DE REIMS CHAMPAGNE ARDENNE   (France)

Author keywords

Insulators; Photo electron emission; Scanning electron microscopy; Secondary electron emission

Indexed keywords

CRYSTALLOGRAPHY; ELECTRONS; SCANNING ELECTRON MICROSCOPY; SECONDARY EMISSION;

ELECTRON YIELD;

ELECTRIC INSULATORS;

EID: 0038243103     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00542-X     Document Type: Article

References (14)

1. A.J. Dekker, Secondary electron emission, Solid State Physics, vol. 6, Academic Press, New York, 1958, p. 251.
2. Hachenberg O., Brauer W. Adv. Electron. Electron Phys. 11:1959;413.
3. Seiler H. J. Appl. Phys. 54:1983;R1.
4. Dekker A.J. Physica. 21:1954;29.
5. Schreiber E., Fitting H.J. J. Electron. Spectrosc. Rel. Phenom. 124:2002;25.
6. Cazaux J. J. Appl. Phys. 89:2001;8265.
7. Liljequist D. Nucl. Instrum. Meth. B. 142:1998;295.
8. Cazaux J. Nucl. Instrum. Meth. B. 192:2002;381.
9. Ushio Y., Banno T., Matuda N., Saito Y., Baba S., Kinbara A. Thin Solid Films. 167:1988;299.
10. Fitting H.J. Phys. Stat. Solidi a. 26:1974;525.
11. Johnson J.B., Mc Kay K.G. Phys. Rev. 91:1953;582.
12. Lyman C.E., Newbury D.E., Goldstein J.E., Williams D.B., Romig A.D., Amstrong J., Echlin P., Fiori C.E., Joy D.C., Lifshin E., Peters K.R. Scanning Electron Microscopy, X-ray Microanalysis and Analytical Electron Microscopy. 1990;Plenum Press.
13. Gullikson E.M., Henke B.L. Phys. Rev. B. 39:1989;1.
14. W.J. Veigelé, X-ray Cross Section Compilation, Defense Nuclear Agency Report No. 2433, Kaman Science Corp., Colorado Springs, Co 80907, 1971.