Determination of sp3/sp2 ratio in amorphous-carbon thin film synthesized by reactive filtered arc deposition

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 339-342

  Li, W J ^a   Song, Z R ^a   Yu, Y H ^a   Zou, S C ^a   Shen, Dashen ^b  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b UNIVERSITY OF ALABAMA IN HUNTSVILLE   (United States)

Author keywords

Bruggeman effective medium approximation; Silicon on insulator; Spectroscopic ellipsometry; Tetrahedral amorphous carbon

Indexed keywords

AMORPHOUS MATERIALS; APPROXIMATION THEORY; CARBON; DEPOSITION; DIELECTRIC PROPERTIES; SILICON ON INSULATOR TECHNOLOGY; SPECTROSCOPIC ANALYSIS; SURFACE ROUGHNESS; SYNTHESIS (CHEMICAL); THERMAL CONDUCTIVITY;

ARC DEPOSITION;

THIN FILMS;

EID: 0038146844     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00758-4     Document Type: Conference Paper

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