Stability of Ta-encapsulating Si clusters on Si(111)-(7 × 7) surfaces

Journal of Physics D: Applied Physics

Volumn 36, Issue 9, 2003, Pages

  Uchida, Noriyuki ^a   Bolotov, Leonid ^a   Miyazaki, Takehide ^a   Kanayama, Toshihiko ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMS; CALCULATIONS; DECOMPOSITION; DEPOSITION; ELECTRON ENERGY LEVELS; ELECTRONIC STRUCTURE; IONS; SCANNING TUNNELING MICROSCOPY; SURFACE STRUCTURE; SYNTHESIS (CHEMICAL); TANTALUM;

STABLE CAGE STRUCTURE; TANTALUM ENCAPSULATING SILICON CLUSTER;

SEMICONDUCTING SILICON;

EID: 0038137022     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/36/9/101     Document Type: Article

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