Plasma roughening of polished SiC substrates

Materials Science in Semiconductor Processing

Volumn 5, Issue 6, 2002, Pages 525-527

  Franz, Gerhard ^a  

^a UNIVERSITY OF APPLIED SCIENCES   (Germany)

Author keywords

Etching; Patterning; RIE; SiC; Surface roughening

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; ETCHING; MASKS; SEMICONDUCTOR PLASMAS;

PLASMA ROUGHENING;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 0038079379     PISSN: 13698001     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1369-8001(02)00115-4     Document Type: Article

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