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Volumn 51, Issue 12, 2003, Pages 3585-3595
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Backward deviation and depth recovery of load-displacement curves of amorphous SiC film under repeating nanoindentation
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Author keywords
Backward deviation; Delamination; Depth recovery; Repeating nanoindentation; Residual stress; Sputtered SiC thin films
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Indexed keywords
AMORPHOUS SILICON;
DELAMINATION;
INDENTATION;
RESIDUAL STRESSES;
SPUTTERING;
NANOINDENTATION;
AMORPHOUS FILMS;
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EID: 0038071576
PISSN: 13596454
EISSN: None
Source Type: Journal
DOI: 10.1016/S1359-6454(03)00176-9 Document Type: Article |
Times cited : (19)
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References (25)
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