Growth and characterization of PNZST thin films

Materials Science and Engineering: B

Volumn 99, Issue 1-3, 2003, Pages 230-233

  Zhai, Jiwei ^a   Li, X ^a   Yao, Y ^a   Chen, Haydn ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Antiferroelectric thin film; Dielectric properties; Microstructure; PNZST; Sol gel technique

Indexed keywords

ANTIFERROELECTRICITY; DIELECTRIC PROPERTIES; FILM GROWTH; HEAT TREATMENT; MICROSTRUCTURE; PEROVSKITE; SCANNING ELECTRON MICROSCOPY; SOL-GELS; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ANTIFERROELECTRIC FILMS;

LEAD COMPOUNDS;

EID: 0038039182     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(02)00457-9     Document Type: Conference Paper

References (11)

1. Yamakawa K., Trolier-Mckinstry S., Dougherty J.P., Krupanidhi S.B. Appl. Phys. Lett. 67:1995;2014.
2. Seveno R., Gundel H.W., Seifert S. Appl. Phys. Lett. 79:2001;4204.
3. Xu B., Moses P., Pai N.G., Cross L.E. Appl. Phys. Lett. 72:1998;593.
4. Jang J.H., Yoon K.H., Shin H.J. Appl. Phys. Lett. 73:1998;1823.
5. Xu B., Ye Y., Cross L.E. J. Appl. Phys. 87:2000;2507.
6. Xu B., Cross L.E., Bernstein J.J. Thin Sol. Films. 377-378:2000;712.
7. Xu B., Ye Y., Wang Q.-M., Cross L.E. J. Appl. Phys. 85:1999;3753.
8. Sengupta S.S., Robert D., Li J.F., Kim M.C., Payne D.A. J. Appl. Phys. 78:1995;1171.
9. Xu B., Cross L.E., Ravichandran D. J. Am. Ceram. Soc. 82:1999;306.
10. Lin C.H., Yen B.M., Kuo H.C., Chen H. J. Mater. Res. 15:2000;115.
11. Bharadwaja S.S.N., Krupanidhi S.B. J. Appl. Phys. 86:1999;5862.