Preparation of Bi2SiO5 -SrBi2Ta2O9 ferroelectric thin films by RF magnetron sputtering

Materials Research Society Symposium - Proceedings

Volumn 748, Issue , 2003, Pages 117-122

  Kikuchi, Shin ^a   Ishiwara, Hiroshi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

BSO; Feroelectric thin film; Leakage current density; RF magnetron sputtering; SBT

Indexed keywords

BISMUTH COMPOUNDS; CURRENT DENSITY; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; SILICON; TITANIUM;

LEAKAGE CURRENT DENSITY;

FERROELECTRIC THIN FILMS;

EID: 0038037158     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)

1. T.Kijima, H.Ishiwara : Jpn. J. Appl. Phys. 41 (2002) No.6B pp.L716 - L719
2. T.Kijima, H.Ishiwara : Jpn. J. Appl. Phys. 41 (2002) No.10B pp.L1164-L1166