Characterizations of (SiOxCr1-x)yN1-y thin film resistors for integrated passive application

Proceedings - Electronic Components and Technology Conference

Volumn , Issue , 2003, Pages 161-166

  Wu, Fan ^a   Morris, James E ^b  

^a MEDTRONIC INC   (United States)

^b Department of Electrical and Computer Engineering   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY MEASUREMENT; MORPHOLOGY; THIN FILM DEVICES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

TEMPERATURE COEFFICIENT OF RESISTIVITY; THIN FIM RESISTORS;

RESISTORS;

EID: 0038013574     PISSN: 05695503     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

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2. C. Gladun, A. Heinrich, F. Lange, J. Schumann, and H. Vinzelberg, "Electrical Transport Properties of High Resistance Cr-Si-O Thin Films", Thin Solid Films, 125, 1985, pp. 101-106.
3. T. J. Coutts, Active and Passive Thin Film Devices, Academic Press, (London 1978), pp. 197-201.
4. F. Wu, A. McLaurin, H. Henson, D. Managhan, and S. Thomasson, "The Effect of the Process Parameters on the Electrical and Microstructure Characteristics of the CrSi Thin Resistor Films", Thin Solid Films, Vol. 332, 1998, pp.418-422.
5. R. glang, R. Holmwood, and S. Herd, "Resistivity and Structure of Cr-SiO Cermet Films", Journal of Vacuum Science and Technology", Vol. 4, 1967, pp. 163-170.
6. C. J. Adkins, "Conduction in Granular Metals - Variable-Range Hopping in A Coulomb Gap?", Journal of Physics: Condensed Matter, Vol. 1, 1989, pp. 1253-1259.
7. J. E. Morris and T. J. Coutts, "Electrical Conduction in Discontinuous Metal Films: a Discussion", Thin Solid Films, Vol. 47, 1977, pp.3-65.