Study on self-bias voltage induced on the substrate by r.f. bias power in a high density plasma

Thin Solid Films

Volumn 435, Issue 1-2, 2003, Pages 288-292

  Kim, Jung Hyung ^a   Shin, Yong Hyun ^a   Chung, Kwang Hwa ^a  

^a Korea Research Institute of Standards and Science   (South Korea)

Author keywords

Blocking capacitor; Etching; Plasma process; RF self bias

Indexed keywords

CAPACITORS; ELECTRIC POTENTIAL; ETCHING;

ION PLASMA FREQUENCY;

PLASMA PROBES;

EID: 0038009034     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00385-7     Document Type: Conference Paper

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