Scanning probe microscope analysis of microstructures in optically variable devices

Microelectronic Engineering

Volumn 60, Issue 3-4, 2002, Pages 339-346

  Leech, Patrick W ^a   Sexton, Brett A ^a   Marnock, Russell J ^a  

^a CSIRO   (Australia)

Author keywords

Anti counterfeiting; E beam resists; Gratings; Optically variable devices; Scanning probe microscopy (SPM)

Indexed keywords

DIFFRACTION GRATINGS; DIFFRACTIVE OPTICS; ELECTRON BEAM LITHOGRAPHY; IMAGE ANALYSIS; MICROSCOPIC EXAMINATION; POLYMETHYL METHACRYLATES;

SCANNING PROBE MICROSCOPES;

MICROELECTRONICS;

EID: 0036532339     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00692-X     Document Type: Article

References (9)

1. Direct writing of continuous-relief micro-optics
2. Efficient diffractive optics made by single-step electron beam lithography in solid PMMA
3. Three-dimensional microstructural elements fabricated by electron beam lithography and dry etching technique
4. Micro-technology for anti-counterfeiting
5. Iridescent optically variable devices: A survey
6. Characterisation of high resolution resists and metal shims by scanning probe microscopy
7. Electron beam lithography