Influence of relevant gas pressure on the properties of lonplated Ta2O5 films

Vakuum in Forschung und Praxis

Volumn 15, Issue 2, 2003, Pages 83-85

  Schlichtherle, S ^a   Huber, D ^a   Pulker, H K ^a  

^a UNIVERSITY OF INNSBRUCK   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; DENSITY (SPECIFIC GRAVITY); DEPOSITION; FUSED SILICA; LIGHT ABSORPTION; OXYGEN; PRESSURE EFFECTS; REFRACTIVE INDEX; STRESSES; THIN FILMS;

LOW VOLTAGE ION PLATING (LVIP);

TANTALUM COMPOUNDS;

EID: 0037952923     PISSN: 0947076X     EISSN: None     Source Type: Journal    
DOI: 10.1002/vipr.200390024     Document Type: Article

References (4)

1. R. Swanepoel, J. Phys. E: Sci. Instrum., Vol. 16, p. 1214, 1983
2. W. Lechner, Thesis: Optische Charakterisierung dünner dielektrischer Schichten abgeschieden mit PVD-Verfahren, University Innsbruck, 1999.
3. G.N. Strauss, Nguyen Quang Danh, H.K. Pulker, Journal of Non-Crystalline Solids 218, 1997. p 256-261
4. G.N. Strauss, W. Lechner, H.K. Pulker, Thin Solid Films 351, 1999. p 53 - 56