Equilibrium surface segregation enthalpy of Ge in concentrated amorphous SiGe alloys

Applied Surface Science

Volumn 212-213, Issue SPEC., 2003, Pages 244-248

  Nyeki J ^a,b   Girardeaux, C ^a   Erdelyi G ^b   Rolland, A ^a   Bernardini, J ^a  

^a CNRS   (France)

^b UNIVERSITY OF DEBRECEN   (Hungary)

Author keywords

Amorphous thin films; Auger electron spectroscopy; Concentrated alloys; Silicon germanium; Surface segregation

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; ENTHALPY; GERMANIUM ALLOYS; MAGNETRON SPUTTERING; THIN FILMS;

SIZE EFFECTS;

SURFACE REACTIONS;

EID: 0037904188     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00097-7     Document Type: Conference Paper

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