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Volumn 495, Issue 3, 2001, Pages 195-203

AES study of surface segregation of Ge in amorphous Si1-xGex thin film alloys

Author keywords

Alloys; Amorphous thin films; Auger electron spectroscopy; Diffusion and migration; Silicon germanium; Surface segregation

Indexed keywords

AMORPHOUS ALLOYS; ANNEALING; AUGER ELECTRON SPECTROSCOPY; DIFFUSION; GERMANIUM; MAGNETRON SPUTTERING; MULTILAYERS; SILICON ALLOYS; SURFACE CHEMISTRY; THIN FILMS;

EID: 0035924093     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(01)01364-4     Document Type: Article
Times cited : (8)

References (27)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.