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Volumn 495, Issue 3, 2001, Pages 195-203
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AES study of surface segregation of Ge in amorphous Si1-xGex thin film alloys
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Author keywords
Alloys; Amorphous thin films; Auger electron spectroscopy; Diffusion and migration; Silicon germanium; Surface segregation
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Indexed keywords
AMORPHOUS ALLOYS;
ANNEALING;
AUGER ELECTRON SPECTROSCOPY;
DIFFUSION;
GERMANIUM;
MAGNETRON SPUTTERING;
MULTILAYERS;
SILICON ALLOYS;
SURFACE CHEMISTRY;
THIN FILMS;
SURFACE SEGREGATION;
SURFACE PHENOMENA;
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EID: 0035924093
PISSN: 00396028
EISSN: None
Source Type: Journal
DOI: 10.1016/S0039-6028(01)01364-4 Document Type: Article |
Times cited : (8)
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References (27)
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