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Volumn 35, Issue 3, 2003, Pages 213-229

Novel high performance materials. Calixarene derivatives containing protective groups and polymerizable groups for photolithography, and calixarene derivatives containing active ester groups for thermal curing of epoxy resins

Author keywords

Calixarene; Cationic polymerization; Epoxy resin; Photoinduced deprotection; Polymerizable group; Protective group; Radical polymerization; Thermal curing; Thermal stability

Indexed keywords

CURING; DERIVATIVES; EPOXY RESINS; ESTERS; INITIATORS (CHEMICAL); PHOTOLITHOGRAPHY; PHOTOPOLYMERIZATION; PLASTIC FILMS; REACTION KINETICS; SYNTHESIS (CHEMICAL); THERMODYNAMIC STABILITY;

EID: 0037854702     PISSN: 00323896     EISSN: None     Source Type: Journal    
DOI: 10.1295/polymj.35.213     Document Type: Article
Times cited : (24)

References (44)
  • 1
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  • 2
    • 0004266535 scopus 로고    scopus 로고
    • Calixarenes in action
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  • 18
    • 0006301218 scopus 로고
    • Synthesis and application of photosensitive polymers
    • T. Nishikubo, T. Ed.; CMC, Tokyo
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    • (1979)
  • 19
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    • UV and EB curings and paints
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    • (1998)
  • 20
    • 0344915900 scopus 로고
    • Synthesis and application of photosensitive polymers, a continuation
    • T. Ogasawara, Ed.; CMC, Tokyo
    • T. Ogasawara, Ed., "Synthesis and Application of Photosensitive Polymers, a Continuation," CMC, Tokyo, 1980, p 403.
    • (1980) , pp. 403
  • 21
    • 0344484651 scopus 로고
    • Application and market of UV and EB curing technology
    • T. Nishikubo, Ed.; CMC, Tokyo
    • T. Nishikubo, Ed., "Application and Market of UV and EB Curing Technology," CMC, Tokyo, 1989, p 56.
    • (1989) , pp. 56
  • 39
    • 0003533112 scopus 로고
    • Phase transfer catalysis
    • C. M. Starks and C. Liotta, Ed.; Academic Press, Inc., New York, N.Y.
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    • (1978)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.