F2 resist based on methacrylonitrile/2-trifluoromethylacrylate copolymers

Journal of Photopolymer Science and Technology

Volumn 16, Issue 4, 2003, Pages 545-548

  Shirai, Masamitsu ^a   Takashiba, Shinichi ^a   Tsunooka, Masahiro ^a  

^a Osaka Prefecture University   (Japan)

Author keywords

157nm Resist; Methacrylonitrile; Outgassing; Photoresist; Trifluoromethylacrylate

Indexed keywords

1 ADAMANTYL 2 TRIFLUOROMETHYLACRYLATE; 2 METHYL 2 ADAMANTYL 2 TRIFLUOROMETHYLACRYLATE; 3 HYDROXY 1 ADAMANTYL 2 TRIFLUOROMETHYLACRYLATE; ACRYLIC ACID METHYL ESTER; COPOLYMER; METHACRYLONITRILE; MONOMER; TERT BUTYL 2 TRIFLUOROMETHYLACRYLATE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL ANALYSIS; FILM; PHOTOCHEMISTRY; POLYMERIZATION; SYNTHESIS;

EID: 0037830822     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.545     Document Type: Article

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