Crystallization by excimer laser annealing for a-Si:H films with low hydrogen content prepared by Cat-CVD

Thin Solid Films

Volumn 430, Issue 1-2, 2003, Pages 296-299

  Yogoro, Yusuke ^a   Masuda, Atsushi ^a   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Catalytic chemical vapor deposition; Excimer laser annealing; Low hydrogen content; Polycrystalline silicon

Indexed keywords

AMORPHOUS SILICON; ANNEALING; CATALYSIS; CRYSTALLIZATION; DEHYDROGENATION; EXCIMER LASERS; GRAIN SIZE AND SHAPE; HYDROGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILICON;

LASER ANNEALING;

AMORPHOUS FILMS;

EID: 0037809469     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00089-0     Document Type: Conference Paper

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