Composition control of radio-frequency magnetron sputter-deposited La0.5Sr0.5CoO3-∂ thin films

Journal of Materials Research

Volumn 18, Issue 1, 2003, Pages 188-194

  Klenov, D O ^a   Donner, W ^b   Chen, L ^b   Jacobson, A J ^b   Stemmer, S ^a  

^a University of California   (United States)

^b University of Houston   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; ELECTRIC CONDUCTIVITY; LANTHANUM COMPOUNDS; MAGNETRON SPUTTERING; MICROSTRUCTURE; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

FILM MICROSTRUCTURES;

THIN FILMS;

EID: 0037772336     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2003.0026     Document Type: Article

References (28)

1. S. deSouza, S.J. Visco, and L.C. DeJonghe, J. Electrochem. Soc. 144, L35 (1997).
2. C.A. Mims, N.I. Joos, P.A.W, v.d. Heide, A.J. Jacobson, C. Chen, C.W. Chu, B.I. Kim, and S.S. Perry, Electrochem. Solid-State Lett. 3, 59 (2000).
3. J. Mizusaki, J. Tabuchi, T. Matsuura, S. Yamauchi, and K. Fueki, J. Electrochem. Soc. 136, 2082 (1989).
4. O.F. Konochuk, T. Norby, and P. Kofstad, Phase Transitions 58, 145 (1996).
5. N.Q. Minh, J. Am. Ceram. Soc. 76, 563 (1995).
6. Y. Teraoka, H-M. Zhang, S. Furukawa, and N. Yamazoe, Chem. Lett. 1743 (1985).
7. R. Ramesh, H. Gilchrist, T. Sands, V.G. Keramidas, R. Haakenaasen, and D.K. Fork, Appl. Phys. Lett. 63, 3592 (1993).
8. A.N. Petrov, O.F. Kononchuk, A.V. Andreev, V.A. Cherepanov, and P. Kofstad, Solid State Ionics. 80, 189 (1995).
9. P.M. Raccah and J.B. Goodenough, J. Appl. Phys. 39, 1209 (1968).
10. E.A.F. Span, F.J.G. Roesthuis, D.H.A. Blank, and H. Rogalla, Appl. Phys. A 69, S783 (1999).
11. S. Madhukar, S. Aggarwal, A.M. Dhote, R. Ramesh, A. Krishnan, D. Keeble, and E. Pointdexter, J. Appl. Phys. 81, 3543 (1997).
12. W. Wu, K.H. Wong, and C.L. Choy, Thin Solid Films 385, 298 (2001).
13. J.T. Cheung, P.E.D. Morgan, D.H. Lowndes, X.Y. Zheng, and J. Breen, Appl. Phys. Lett. 62, 2045 (1993).
14. Q.X. Jia, P.N. Arendt, C. Kwon, J.M. Roper, Y. Fan, J.R. Groves, and S.R. Foltyn, J. Vac. Sci. Technol. A 16, 1380 (1998).
15. H. Masumoto, S. Hiboux, and P. Muralt, Ferroelectrics 225, 1141 (1999).
16. R.H.E. van Doom and A.J. Burggraaf, Solid State Ionics. 128, 65 (2000).
17. J. Kirchnerova and D.B. Hibbert, Mater. Res. Bull. 25, 585 (1990).
18. S. Stemmer, A.J. Jacobson, X. Chen, and A. Ignatiev, J. Appl. Phys. 90, 3319 (2001).
19. E.A.F. Span, F.J.G. Roesthuis, D.H.A. Blank, and H. Rogalla, Appl. Surf. Sci. 150, 171 (1999).
20. R.A. Gunasekaran, J.D. Pedarnig, and M. Dinescu, Appl. Phys. A Mater. Sci. Proc. 69, 621 (1999).
21. Z.L. Wang and J.S. Yin, Philos. Mag. B 77, 49 (1998).
22. M.V. Raymond, H.N. Al-Shareef, B.A. Tuttle, D. Dimos, and J.T. Evans, in Ferroelectric Thin Films V, edited by S.B. Desu, R. Ramesh, B.A. Tuttle, R.E. Jones, and I.K. Yoo (Mater. Res. Soc. Symp. Proc. 433, Pittsburgh, PA, 1996), pp. 145-150.
23. F. Morin, G. Trudel, and Y. Denos, Solid State Ionics 96, 129 (1997).
24. A. Hamerich, R. Wunderlich, and J. Muller, J. Vac. Sci. Technol. A 12, 2873 (1994).
25. J.R. Gavaler, J. Talvacchio, T.T. Braggins, M.G. Forrester, and J. Greggi, J. Appl. Phys. 70, 4383 (1991).
26. C.N.R. Rao, J. Gopalakrishnan, and K. Vidyasagar, Ind. J. Chem. 23A, 265 (1984).
27. H. Ullmann, N. Trofimenko, F. Tietz, D. Stöver, and A. Ahmad-Khanlou, Solid State Ionics. 138, 79 (2000).
28. S. Ramesh, S.S. Manoharan, and M.S. Hegde, J. Mater. Chem. 5, 1053 (1995).