Performance of the modified suss XRS 200/2M X-ray stepper at CXrL

Japanese Journal of Applied Physics

Volumn 33, Issue 12S, 1994, Pages 689-694

  Reilly, Michael ^a   Leonard, Quinn ^a   Wells, Gregory ^a   Capasso, Cristiano ^b   Anderson, Paul ^b   Taylor, James ^b   Waldo, Whit ^b   Yamazaki, Kuniaki ^b   Chen, Gong ^b   Simon, Klaus ^c   Cerrina, Franco ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b MOTOROLA INC   (United States)

^c Suss Advanced Lithography Inc   (United States)

Author keywords

Alignment; Dosimetry; Membrane; Optical spectra; Signal intensity

Indexed keywords

EID: 84957332060     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.33.6899     Document Type: Article

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