Photon-enhanced secondary electron emission at target in plasma immersion ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 798-802

  Nakamura, Keiji ^a   Ando, Masaki ^b   Sugai, Hideo ^b  

^a CHUBU UNIVERSITY   (Japan)

^b NAGOYA UNIVERSITY   (Japan)

Author keywords

Discharge modulation; Plasma immersion ion implantation; Secondary electron emission coefficient; Vacuum ultraviolet optical emission

Indexed keywords

PHOTONS; PLASMA APPLICATIONS; PULSE GENERATORS; SECONDARY EMISSION; VACUUM APPLICATIONS;

PLASMA IMMERSION;

ION IMPLANTATION;

EID: 0037737475     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00852-8     Document Type: Conference Paper

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