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Volumn 11, Issue 2, 2002, Pages 161-164
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Direct measurements of sheath-accelerated secondary electrons for monitoring the incident ion flux in plasma immersion ion implantation
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL IMPURITIES;
ELECTRIC POTENTIAL;
ION IMPLANTATION;
IONIZATION;
PARTICLE DETECTORS;
PLASMA SHEATHS;
SEMICONDUCTOR DEVICES;
TARGETS;
ION FLUXES;
PLASMA IMMERSIONS;
ELECTRON EMISSION;
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EID: 0036575222
PISSN: 09630252
EISSN: None
Source Type: Journal
DOI: 10.1088/0963-0252/11/2/306 Document Type: Article |
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Times cited : (10)
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References (12)
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