A novel instrumentation for contamination and deposition control on 300 mm silicon wafers employing synchrotron radiation based TXRF and EDXRF analysis

Solid State Phenomena

Volumn 92, Issue , 2003, Pages 89-92

  Beckhoff, B ^a   Fliegauf, R ^a   Weser, J ^a   Ulm, G ^a  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

Author keywords

300 mm wafer; Contamination analysis; Deposition control; EDXRF; Synchrotron; TXRF

Indexed keywords

CONTAMINATION; DEPOSITION; MANIPULATORS; MONOCHROMATORS; RADIOMETRY; SILICON WAFERS; STORAGE RINGS; SYNCHROTRON RADIATION; X RAYS; CHUCKS; ENERGY DISPERSIVE SPECTROSCOPY; FLUORESCENCE; SYNCHROTRONS;

DEPOSITION CONTROL; ENERGY-DISPERSIVE X-RAY FLUORESCENCE ANALYSIS; TOTAL REFLECTION X-RAY FLUORESCENCE; 300 MM WAFERS; CONTAMINATION ANALYSIS; EDXRF; TXRF;

FLUORESCENCE; SILICON WAFERS;

EID: 0037731253     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/ssp.92.89     Document Type: Conference Paper

References (6)

1. P. Pianetta, N. Takaura, S Brennan, W. Tompkins, S.S. Laderman, A. Fischer-Colbrie, A. Shimazaki, K. Miyazaki, M. Madden, D.C. Wherry, J.B. Kortright, Rev. Sci. Instrum. 66, 1293-1297 (1995).
2. F. Comin, M. Navizet P. Mangiagalli, G. Apostolo. Nucl. Instr. Meth. Phys. B 150, 538-542 (1999).
3. C. Streli, P. Wobraschek, P. Kregsamer, G. Pepponi, P. Pianetta. S. Pahlke, L. Fabry, Spectrochim. Acta Part B 56, 2085-2094 (2001).
4. B. Beckhoff, R. Klein, M. Krumrey, F. Scholze, R. Thormagel, G. Ulm. Nucl. Instrum. Meth. A444, 480-483 (2000).
5. B. Beckhoff, R. Fliegauf, G. Ulm, G. Pepponi, C. Streli, P. Wobrauschek, L. Fabry, S. Pahlke, Spectrochim. Acta Part B 56, 2073-2083 (2001)
6. M. Veldkamp, B. Beckhoff, R. Fliegauf, G. Ulm, M. Frank, S. Friedrich, S. E. Labov, Nucl. Instrum. Meth. A, 487/3, 450-456 (2002).