Stabilization of indium tin oxide films to very high temperatures

Materials Research Society Symposium - Proceedings

Volumn 751, Issue , 2003, Pages 109-114

  Gregory, Otto J ^a   You, Tao ^a   Platek, Michael ^a   Crisman, Everett ^a  

^a The University of Rhode Island   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; COATINGS; DIFFUSION; ELECTRON SPECTROSCOPY; HIGH TEMPERATURE EFFECTS; OXIDATION; STOICHIOMETRY; STRAIN GAGES; SURFACE CHEMISTRY; TIN COMPOUNDS;

ELECTRICAL STABILITY;

THIN FILMS;

EID: 0037699793     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)

1. Gregory. O. J Ceramic Strain gages for use at temperatures up to 1500°C. Annual Technical Report of NASA Aerospace Propulsion and Power Program NRA-01 -GRC-02
2. Gregory, O.J. and Cooke, J.D et al. High temperature- thin film strain gages based on Alloys of indium tin oxide. AGARD PEP symposium. Brussels, Belgium, 20-24 October 1997.
3. Kim, H and Horwitz, J.S. et al. Effect of film thickness on the properties of indium tin oxide films. Journal of applied physics. 10(88) 6021 -6025
4. Gregory, O.J and Dyer, S. et al. Characteristics of a reactively sputtered indium tin oxide thin film strain gage for use at elevated temperature. Mat. Res. Soc. Sym. Proc. Vol.403. 1996.
5. Gregory, O.J. and Luo, Q. High temperature stability of indium tin oxide thin films. Thin solid film. 406(2002) 286-293.
6. Salif M. etal. Aluminum doped indium tin oxide (ITO) films prepared by DC Magnetron Sputtering. 1997. Society of vacuum coaters 505/856-7188