Electro-deposition of tantalum on tungsten and nickel in LiF-NaF-CaF2 melt containing K2TaF7 - Electrochemical study

Materials Transactions

Volumn 44, Issue 2, 2003, Pages 259-267

  Mehmood, Mazhar ^a   Kawaguchi, Nobuaki ^a   Maekawa, Hideki ^a   Sato, Yuzuru ^a   Yamamura, Tsutomu ^a   Kawai, Masayoshi ^b   Kikuchi, Kenji ^c  

^a TOHOKU UNIVERSITY   (Japan)

^b HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION KEK   (Japan)

^c JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

Coating; Electro deposition; Intermetallic compound; Molten salt; Nickel; Tantalum; Tungsten

Indexed keywords

DIFFUSION; DISSOLUTION; ELECTROCHEMISTRY; ELECTRODEPOSITION; GROWTH (MATERIALS); INTERFACES (MATERIALS); INTERMETALLICS; IONS; NICKEL; REDUCTION; TUNGSTEN;

ELECTROLYTIC COATING; GALVANOSTIC POLARIZATION; OXIDE IONS;

TANTALUM;

EID: 0037629097     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.44.259     Document Type: Article

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