Electrical and structural characterization of HfO2 MIM capacitors

Materials Research Society Symposium - Proceedings

Volumn 745, Issue , 2002, Pages 203-208

  Yang, Fan ^a   Kotecki, David E ^a   Bernhardt, George ^a   Call, Michael ^a  

^a UNIVERSITY OF MAINE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; CURRENT DENSITY; DIELECTRIC DEVICES; HAFNIUM COMPOUNDS; MAGNETRON SPUTTERING; MICROELECTRONICS; PROFILOMETRY; X RAY DIFFRACTION ANALYSIS;

QUARTZ SUBSTRATES;

MIM DEVICES;

EID: 0037617761     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-745-n5.16     Document Type: Conference Paper

References (5)

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3. Wen-Jie Qi, Byoung Hum Lee, Renee Nieh, Laegu Kang, Yongjoo Jeon, Katsu Onishi and Jack C. Lee, "High-K Gate Dielectrics," Proceedings of SPIE - The International Society for Optical Engineering, v3881, 1999, p24-32.
4. 2 thin films," Biomaterials, vol.23, no. 12, pp. 2545-2552 (2002).
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