Thermal stability of high k layers

Materials Research Society Symposium - Proceedings

Volumn 745, Issue , 2002, Pages 9-14

  Zhao, C ^a   Cosnier, V ^b   Chen, P J ^c   Richard, O ^a   Roebben, G ^d   Maes, J ^a   Van Elshocht, S ^a   Bender, H ^a   Young, E ^e   Van Der Biest, O ^d   Caymax, M ^a   Vandervorst, W ^a   De Gendt, S ^a   Heyns, M ^a  

^a IMEC   (Belgium)

^b STMICROELECTRONICS   (Belgium)

^c TEXAS INSTRUMENTS   (Belgium)

^d UNIVERSITY OF LEUVEN   (Belgium)

^e PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; ANNEALING; CRYSTALLIZATION; HAFNIUM COMPOUNDS; PHASE TRANSITIONS; THERMODYNAMIC STABILITY; ZIRCONIA;

HAFNIUM OXIDES;

DIELECTRIC MATERIALS;

EID: 0037504343     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-745-n1.5     Document Type: Conference Paper

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