Dynamic plasma CVD and preparation of functional organic thin films

Journal of Photopolymer Science and Technology

Volumn 16, Issue 1, 2003, Pages 61-65

  Yajima, Tatsuhiko ^a   Kuroda, Takeshi ^a   Okabe, Yoshio ^a   Sugiyama, Kazuo ^b  

^a SAITAMA INSTITUTE OF TECHNOLOGY   (Japan)

^b SAITAMA UNIVERSITY   (Japan)

Author keywords

Fluorohydrocarbons; Plasma polymerization; Super water repellency; Thin film

Indexed keywords

FLUORINATED HYDROCARBON; HYDROCARBON; NORFLURANE; POLYMER; VINYLIDENE CHLORIDE;

ARTICLE; ATOMIC EMISSION SPECTROMETRY; CHEMICAL COMPOSITION; CHEMICAL VAPOR DEPOSITION; ELECTRON; HYDROPHILICITY; HYDROPHOBICITY; MOLECULAR DYNAMICS; SOLID; SURFACE PROPERTY; TECHNIQUE; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0037492946     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.61     Document Type: Article

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