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Volumn , Issue , 2002, Pages 83-88

"CV doping profiling of boron out-diffusion using an abrupt and highly doped arsenic buried epilayer"

Author keywords

[No Author keywords available]

Indexed keywords

ARSENIC; BORON; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; DIFFUSION; EPITAXIAL GROWTH; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DOPING;

EID: 0037481718     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (5)

References (8)
  • 1
    • 0034322216 scopus 로고    scopus 로고
    • Control of arsenic doping during low temperature CVD epitaxy of silicon (100)
    • W.D. van Noort, L.K. Nanver, J.W. Slotboom, "Control of Arsenic Doping during Low Temperature CVD Epitaxy of Silicon (100)", J. Elec. Soc., vol. 147, No. 11, 2000, pp. 4301-4304.
    • (2000) J. Elec. Soc. , vol.147 , Issue.11 , pp. 4301-4304
    • Van Noort, W.D.1    Nanver, L.K.2    Slotboom, J.W.3
  • 2
    • 0002734525 scopus 로고
    • Impurity processes in silicon
    • edited by F. F. Y. Wang (North-Holland, Amsterdam, The netherlands)
    • R. B. Fair, "Impurity Processes in Silicon", edited by F. F. Y. Wang (North-Holland, Amsterdam, The netherlands, 1981), p 315.
    • (1981) , pp. 315
    • Fair, R.B.1
  • 5
    • 0013227437 scopus 로고
    • On the measurement of impurity atoms distributions in silicon by the differential capacitance technique
    • D. P. Kennedy, P.C. Murley and W. Kleinfelder, "On the measurement of impurity atoms distributions in silicon by the differential capacitance technique", IBM J. Res. Develop. 12, 399 (1968)
    • (1968) IBM J. Res. Develop. , vol.12 , pp. 399
    • Kennedy, D.P.1    Murley, P.C.2    Kleinfelder, W.3
  • 6
    • 0038583188 scopus 로고
    • On the measurement of impurity atoms distributions by the differential capacitance technique
    • D. P. Kennedy and R. R. O'brien, "On the measurement of impurity atoms distributions by the differential capacitance technique", IBM J. Res. Develop. 13, 212 (1969)
    • (1969) IBM J. Res. Develop. , vol.13 , pp. 212
    • Kennedy, D.P.1    O'Brien, R.R.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.