Porphyrin deposition induced by UV irradiation

Journal of the American Chemical Society

Volumn 125, Issue 8, 2003, Pages 2040-2041

  Monsù Scolaro, Luigi ^a,b,c   Romeo, Andrea ^a,b   Castriciano, Maria Angela ^a   De Luca, Giovanna ^a   Patanè, Salvatore ^a,b   Micali, Norberto ^d  

^a UNIVERSITY OF MESSINA   (Italy)

^b INFM   (Italy)

^c CNR   (Italy)

^d CNR   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

PORPHYRIN;

ARTICLE; FLUORESCENCE; OPTICS; STRUCTURE ANALYSIS; SYNTHESIS; ULTRAVIOLET IRRADIATION;

EID: 0037467146     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja029134y     Document Type: Article

References (27)

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25. The solvent, placed in a 1 cm path length silica cell, was irradiated 300 s by an unfiltered 20 W deuterium lamp or by using the 352 nm line of a 10 mW He/Cd laser.
26. 2) with a Xe lamp (75 W) placed at 50 cm. A micropatterned mask was placed between the UV source and the target.
27. 2 to remove the porphyrin excess, the tip was observed through an optical microscope in fluorescence mode (excitation green filter).