Spatial distribution of charged particles in a magnetic neutral loop discharge etcher: Experimental results and numerical simulations

Surface and Coatings Technology

Volumn 166, Issue 2-3, 2003, Pages 135-140

  Sung, Youl Moon ^a   Sakoda, Tatsuya ^b  

^a UNIVERSITY OF MIYAZAKI   (Japan)

^b SOJO UNIVERSITY   (Japan)

Author keywords

Double probe; Downstream; Neutral loop discharge (NLD); Processing plasma; Thomson scattering

Indexed keywords

CARRIER CONCENTRATION; ETCHING; LASER APPLICATIONS; MAGNETIC FIELD EFFECTS; PLASMA DENSITY;

NEUTRAL LOOP DISCHARGE (NLD) ETCHER SYSTEM;

COATING TECHNIQUES;

MATHEMATICAL ANALYSIS;

EID: 0037464311     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00778-8     Document Type: Article

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