The adsorption of orthocarborane on cobalt

Thin Solid Films

Volumn 428, Issue 1-2, 2003, Pages 253-256

  Bernard, L ^a,b   Caruso, A N ^a   Xu, Bo ^a   Doudin, B ^a   Dowben, P A ^a  

^a UNIVERSITY OF NEBRASKA LINCOLN   (United States)

^b EPFL   (Switzerland)

Author keywords

Adsorption; Boron carbide; Cobalt; Electron spectroscopy; Tunnel junction barriers

Indexed keywords

ADSORPTION; CHEMICAL VAPOR DEPOSITION; ELECTRON SPECTROSCOPY; EVAPORATION; PHOTOEMISSION; THIN FILMS;

TUNNEL JUNCTION BARRIERS;

COBALT;

EID: 0037457151     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01283-X     Document Type: Conference Paper

References (31)

1. Moodera J.S., Kinder L.R., Wong T.M., Meservey R. Phys. Rev. Lett. 74:1996;3273.
2. Miyazaki T., Tezuda N. J. Magn. Magn. Mater. 139:1995;L231.
3. T.J. Regan, H. Ohldag, C. Stamm, F. Nolting, J. Luning, J. Stohr, R.L. White, Phys. Rev. B 64 (2001) art. no. 214422.
4. Ohldag H., Scholl A., Nolting F., Anders S., Hillebrecht F.U., Stohr J. Phys. Rev. Lett. 86:2001;2878-2881.
5. Cheng R., Borca C.N., Pilet N., Xu B., Yuan L., Doudin B., Liou S.H., Dowben P.A. Appl. Phys. Lett. 81:2002;2109-2111.
6. Greber T., Auwärter W., Ostwalder J. Moran-Lopez J.L. The Physics of Low Dimensional Systems. 2000;Plenum, New York.
7. Osterwalder J. J. Electron Spectrosc. Rel. Phenom. 117-118:2001;71.
8. Mazin I.I. Phys. Rev. Lett. 83:1999;1427.
9. Mathon J. Phys. Rev. B. 56:1997;11810.
10. Lee S., Mazurowski J., Ramseyer G., Dowben P.A. J. Appl. Phys. 72:1992;4925.
11. Lee S., Dowben P.A. Appl. Phys. A. 58:1994;223.
12. Kim Y.-G., Dowben P.A., Spencer J.T., Ramseyer G.O. J. Vac. Sci. Technol. A. 7:1989;2796.
13. Byun D., Hwang S., Dowben P.A., Perkins K., Filips F., Janno N.J. Appl. Phys. Lett. 64:1994;1968.
14. Hwang S.-D., Byun D., Janno N.J., Dowben P.A., Kim H.R. Appl. Phys. Lett. 68:1996;1495-1497.
15. Hwang S.-D., Remmes N.B., Dowben P.A., McIlroy D.N. J. Vac. Sci. Technol. B. 14:1996;2957-2960.
16. Hwang S.-D., Yang K., Dowben P.A., Ahmad A.A., Janno N.J., Li J.Z., Lin J.Y., Jiang H.X., Mcllroy D.N. Appl. Phys. Lett. 70:1997;1028-1030.
17. McIlroy D.N., Hwang S.-D., Yang K., Remmes N., Dowben P.A., Ahmad A.A., Janno N.J., Li J.Z., Lin J.Y., Jiang H.X. Appl. Phys. A. 67:1998;335-342.
18. Robertson B.W., Adenwalla S., Harken A., Welsch P., Brand J.I., Dowben P.A., Claassen J.P. Appl. Phys. Lett. 80:2002;3644-3646.
19. Zeng H., Byun D., Zhang J., Vidali G., Onellion M., Dowben P.A. Surf. Sci. 313:1994;239-250.
20. Byun D., Hwang S., Zhang J., Zeng H., Perkins F.K., Vidali G., Dowben P.A. Jap. J. Appl. Phys. Lett. 34:1995;L941-L944.
21. Zhang J., Mcllroy D.N., Dowben P.A., Zeng H., Vidali G., Heskett D., Onellion M. J. Phys. Cond. Matt. 7:1995;7185-7194.
22. McIlroy D.N., Zhang J., Dowben P.A., Heskett D. Mat. Sci. Eng. A. 217/218:1996;64-68.
23. McIlroy D.N., Waldfried C., McAvoy T., Choi J.W., Dowben P.A., Heskett D. Chem. Phys. Lett. 264:1997;168-173.
24. Carpinelli J.M., Plummer E.W., Byun D., Dowben P.A. J. Vac. Sci. Technol. B. 13:1995;1203-1206.
25. Hitchcock A.P., Wen A.T., Lee S., Glass J.A. Jr., Spenser J.T., Dowben P.A. J. Phys. Chem. 97:1993;8171.
26. Victora R.H., Falicov L.M. Phys. Rev. B. 28:1983;5232.
27. Miranda R., Yndurain F., Chandesris D., Lecant J., Petroff Y. Phys. Rev. B. 25:1982;527.
28. Miranda R., Yndurain F., Chandesris D., Lecant J., Petroff Y. Surf. Sci. 117:1982;319.
29. Himpsel F.J. Phys. Rev. B. 43:1983;13394.
30. Briggs D. Clarke D.R., Suresh S., Ward I.M. (Eds.), Surface Analysis of Polymers by XPS and Static SIMS, Cambridge Solid State Science Series. 1998;Cambridge University Press.
31. Handbook of X-ray Photoelectron Spectroscopy, Perkin Elmer Corp., Physical Electronics Division, 1992, p. 82-83.