Oblique ion texturing of yttria-stabilized zirconia: The {211}〈111〉 structure

Applied Physics Letters

Volumn 82, Issue 3, 2003, Pages 343-345

  Berdahl, Paul ^a   Reade, Ronald P ^a   Liu, Jinping ^a,b   Russo, Richard E ^a   Fritzemeier, Les ^c,d   Buczek, David ^c   Schoop, Urs ^c  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b CHARTERED SEMICONDUCTOR MANUFACTURING LTD   (Singapore)

^c AMERICAN SUPERCONDUCTOR CORPORATION   (United States)

^d NONE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; CRYSTALLIZATION; EPITAXIAL GROWTH; ION BEAMS; ION BOMBARDMENT; MAGNETRON SPUTTERING; NUCLEATION; SUBSTRATES; SYNTHESIS (CHEMICAL); TEXTURES; ZIRCONIA;

ION TEXTURING;

AMORPHOUS FILMS;

EID: 0037455102     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1536266     Document Type: Article

References (23)

1. G. H. Gilmer, H. Huang, and C. Roland, Computational Mat. Sci. 12, 354 (1998).
2. Y. Iijima, N. Tanabe, O. Kohno, and Y. Ikeno, Appl. Phys. Lett. 60, 769 (1992).
3. R. P. Reade, P. Berdahl, S. M. Garrison, and R. E. Russo, Appl. Phys. Lett. 61, 2231 (1992).
4. C. P. Wang, K. B. Do, M. R. Beasley, T. H. Geballe, and R. H. Hammond, Appl. Phys. Lett. 71, 2955 (1997).
5. J. O. Willis, P. N. Arendt, S. R. Foltyn, Q. X. Jia, J. R. Groves, R. F. DePaula, P. C. Dowden, E. J. Peterson, T. G. Holesinger, J. Y. Coulter, M. Ma, M. P. Maley, and D. E. Peterson, Physica C 335, 73 (2000).
6. T. Mizutani, J. Non-Cryst. Solids 181, 123 (1995).
7. Ch. B, Lioutas, N. Vouroutzis, S. Logothetidis, and S. Boultadakis, Carbon 36, 545 (1998).
8. K. Pangal, J. C. Sturm, S. Wagner, and T. H. Buyuklimanli, J. Appl. Phys. 85, 1900 (1999).
9. R. P. Reade, P. Berdahl, and R. E. Russo, Appl. Phys. Lett. 80, 1352 (2002).
10. P. Berdahl, J. Liu, R. P. Reade, and R. E. Russo, in Proceedings of the Annual Meeting of the American Ceramic Society, St. Louis, May 2002 (in press).
11. A. Godfrey, D. J. Jensen, and N. Hansen, Acta Mater. 46, 835 (1998).
12. F. J. Humphreys and M. Hatherly, Recrystallization and Related Annealing Phenomena (Elsevier, Oxford, 1995), Sec. 2.4.
13. D. L. Wood, K. Nassau, and T. Y. Kometani, Appl. Opt. 29, 2485 (1990).
14. S. Ramanathan, D. A. Muller, G. D. Wilk, C. M. Park, and P. C. McIntryre, Appl. Phys. Lett. 79, 3311 (2001).
15. P. S. Manning, J. D. Sirman, R. A. De Souza, and J. A. Kilner, Solid State Ionics 100, 1 (1997).
16. D. Dobrev, Thin Solid Films 92, 41 (1982).
17. R. M. Bradley, J. M. E. Harper, and D. A. Smith, J. Appl. Phys. 60, 4160 (1986).
18. L. Dong and D. J. Srolovitz, Appl. Phys. Lett. 75, 584 (1999).
19. R. Tarumi, A. Ogura, M. Shimojo, K. Takashima, and Y. Higo, Jpn. J. Appl. Phys. 39, L611 (2000).
20. A. Ogura, R. Tarumi, M. Shimojo, K. Takashima, and Y. Higo, Appl. Phys. Lett. 79, 1042 (2001).
21. J. Friedrich, U. Herr, and K. Samwer, Phys. Status Solidi A 189, 897 (2002).
22. B. Ma, M. Li, Y. A. Jee, R. E. Koritala, B. L. Fisher, and U. Balachandran, Physica C 366, 270 (2002).
23. D. Youm and J. H. Kim, Physica C 275, 273 (1997).