Surface characterization using metastable impact electron spectroscopy of adsorbed xenon

Journal of Physical Chemistry B

Volumn 107, Issue 2, 2003, Pages 592-596

  Kim, Y D ^a   Stultz, J ^a   Wei, T ^a   Goodman, D W ^a  

^a TEXAS A AND M UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CYLINDRICAL MIRROR ANALYZER; METASTABLE IMPACT ELECTRON SPECTROSCOPY; SURFACE CHARACTERIZATION; ULTRAVIOLET PHOTOELECTRON SPECTROSCOPY;

ADSORPTION; AUGER ELECTRON SPECTROSCOPY; BINDING ENERGY; ENERGY GAP; LOW ENERGY ELECTRON DIFFRACTION; PHOTOEMISSION; QUENCHING; SURFACE PROPERTIES; TEMPERATURE PROGRAMMED DESORPTION; ULTRAHIGH VACUUM; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

XENON;

EID: 0037448506     PISSN: 10895647     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0219294     Document Type: Article

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