Excimer laser ablation lithography applied to the fabrication of reflective diffractive optics

Applied Surface Science

Volumn 208-209, Issue 1, 2003, Pages 238-244

  Flury, M ^a   Benatmane, A ^b   Gerard P ^a,c   Montgomery, P C ^b   Fontaine, J ^a   Engel, T ^a   Schunck, J P ^b   Fogarassy, E ^b  

^a UNIVERSITÉ DE STRASBOURG   (France)

^b CNRS   (France)

^c Arcofluid   (France)

Author keywords

Diffractive optical elements; Interference microscopy; Kinoforms; Laser marking; Photoablation; Photoresist; Surface morphology

Indexed keywords

BRAZING; CARBON DIOXIDE LASERS; EXCIMER LASERS; LASER ABLATION; LITHOGRAPHY; MORPHOLOGY; NEODYMIUM LASERS; POLYMETHYL METHACRYLATES; REACTIVE ION ETCHING; COMPUTER GENERATED HOLOGRAPHY; DIFFRACTION GRATINGS; ETCHING; OPTICAL BEAM SPLITTERS; OPTICAL INTERCONNECTS; PHOTOLITHOGRAPHY; PHOTORESISTORS; SURFACE PROPERTIES;

KINOFORMS; LASER MARKING; LASER ABLATION LITHOGRAPHY (LAL); LASER BEAM WRITINGS (LBW);

DIFFRACTION GRATINGS; DIFFRACTIVE OPTICS;

EID: 0037443213     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)01391-0     Document Type: Conference Paper

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