Large area, high resolution analysis of surface roughness of semiconductors using interference microscopy

Materials Science and Engineering: B

Volumn 91-92, Issue , 2002, Pages 79-82

  Montgomery, P C ^a   Benatmane, A ^a   Fogarassy, E ^a   Ponpon, J P ^a  

^a CNRS   (France)

Author keywords

Interference microscopy; Laser processing; Semiconductors; Silicon; Surface morphology; Surface roughness

Indexed keywords

ANNEALING; LASER APPLICATIONS; MICROSCOPIC EXAMINATION; MORPHOLOGY; NONDESTRUCTIVE EXAMINATION; OPTIMIZATION; SCANNING; SURFACE ROUGHNESS;

INTERFERENCE MICROSCOPY;

SEMICONDUCTOR MATERIALS;

EID: 0037197418     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(01)00977-1     Document Type: Conference Paper

References (13)