Etch damage evaluation of low-angle, forward-reflected neutral beam etching

Materials Science and Engineering C

Volumn 23, Issue 1-2, 2003, Pages 221-224

  Lee, D H ^a   Chung, M J ^a   Hwang, H K ^a   Yeom, G Y ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Etching; Low Damage; Neutral

Indexed keywords

ELECTRIC BREAKDOWN; ETCHING; ION BEAMS; SILICON; SURFACE TREATMENT;

NEUTRAL BEAMS;

MATERIALS SCIENCE;

ETCHING;

EID: 0037439920     PISSN: 09284931     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0928-4931(02)00271-0     Document Type: Article

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