Fluorine doping in transparent conductive ZnO thin films by a sol-gel method using trifluoroacetic acid

Journal of Materials Science Letters

Volumn 17, Issue 9, 1998, Pages 781-783

  Fujihara, Shinobu ^a   Kusakado, Junko ^a   Kimura, Toshio ^a  

^a KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; ELECTRON ENERGY LEVELS; FILM PREPARATION; FLUORINE; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

FLUORINE DOPING; OPTICAL TRANSMITTANCE SPECTRA; SOL GEL METHOD; TRIFLUOROACETIC ACID;

CONDUCTIVE FILMS;

EID: 0032070329     PISSN: 02618028     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1006647919562     Document Type: Article

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