Detection of nitrogen dioxide using mixed tungsten oxide-based thick film semiconductor sensor

Talanta

Volumn 59, Issue 4, 2003, Pages 667-672

  Su, P G ^a   Wu, Ren Jang ^b   Nieh, Fang Pei ^c  

^a TZU HUI INSTITUTE OF TECHNOLOGY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^c China College of Marine Technology and Commerce   (Taiwan)

Author keywords

Mixed WO3 based; NO2 gas; Noble metal; Semiconductor gas sensor; Thick film

Indexed keywords

NITROGEN OXIDES; OXIDES; SCREEN PRINTING; STABILITY; THICK FILM DEVICES;

CROSS SENSITIVITY EFFECT;

CHEMICAL SENSORS;

GOLD; INDIUM; METAL OXIDE; NITROGEN DIOXIDE; OXIDE; PALLADIUM; PLATINUM; TIN DERIVATIVE; TITANIUM DIOXIDE; TUNGSTEN;

ARTICLE; CHEMICAL ANALYSIS; CONCENTRATION RESPONSE; GAS ANALYSIS; MOLECULAR STABILITY; REACTION ANALYSIS; SEMICONDUCTOR; SENSITIVITY AND SPECIFICITY;

EID: 0037429621     PISSN: 00399140     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-9140(02)00582-9     Document Type: Article

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