메뉴 건너뛰기




Volumn 48, Issue 1-3, 1998, Pages 322-327

Gas-sensing properties of SnxWO3+x mixed oxide thick films

Author keywords

Gas sensor; Mixed oxide; Stannous tungstate; Thick film

Indexed keywords

ALUMINA; CHEMICAL SENSORS; CRYSTAL STRUCTURE; ELECTRIC PROPERTIES; MIXTURES; MOSSBAUER SPECTROSCOPY; RAMAN SPECTROSCOPY; SCREEN PRINTING; SEMICONDUCTING TIN COMPOUNDS; X RAY DIFFRACTION;

EID: 0032068853     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-4005(98)00065-3     Document Type: Article
Times cited : (37)

References (8)
  • 8
    • 0030835222 scopus 로고    scopus 로고
    • Computational approach for the chemical sensitivity of oxide and sulphide semiconductor surfaces
    • T.S. Rantala, V. Lantto, Computational approach for the chemical sensitivity of oxide and sulphide semiconductor surfaces, Physica Scripta T69 (1997) 259-263.
    • (1997) Physica Scripta , vol.T69 , pp. 259-263
    • Rantala, T.S.1    Lantto, V.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.