Nanocarbonaceous materials synthesized by microwave CVD and their characteristics of electron field emission

Microelectronic Engineering

Volumn 66, Issue 1-4, 2003, Pages 2-9

  Cheng, Hsiu Fung ^a   Chen, Tong T ^b   Tsai, Chun Horng ^b   Lin, I Nan ^b  

^a NATIONAL TAIWAN NORMAL UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Carbon material; Diamond film; Electron field emission

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; COATINGS; CURRENT DENSITY; DIAMOND FILMS; DOPING (ADDITIVES); MICROWAVES; SYNTHESIS (CHEMICAL);

NEGATIVE ELECTRON AFFINITY (NEA);

ELECTRON EMISSION;

EID: 0037393549     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00017-0     Document Type: Conference Paper

References (12)

1. Spindt C.A., Brodie I., Humphrey L., Westerberg E.R. J. Appl. Phys. 47:1976;5248-5263.
2. Van Gorkom G.G.P., Hoeberechts A.M.E. J. Vac. Sci. Technol. B. 4:1986;108-111.
3. Himpsel F.J., Knapp J.A., Van Vechten J.A. Phys. Rev. 20:1979;624-627.
4. Zhu W., Kochanski G.P., White A.E. Appl. Phys. Lett. 67:1996;1157-1159.
5. Ku T.K., Chen S.H., Cheng H.C. IEEE Electron. Device Lett. 17:1996;208-210.
6. Glesener J.W., Morrish A.A. Appl. Phys. Lett. 69:1996;785-788.
7. Okano K., Koizumi S., Amaratunga G. Nature. 381:1996;140-141.
8. Okano K., Gleason K.K. Electronics Lett. 31:(1):1995;74-78.
9. Geis M.W., Twichell J.C., Lyszczarz T.M. Appl. Phys. Lett. 68:1996;2294-2297.
10. Chen Y.H., Hu C.T., Lin I.N. J. Appl. Phys. 84:1998;3890-3894.
11. Shih C.F., Liu K.S., Lin I.N. Diam. Rel. Mater. 9:2000;1591-1599.
12. Vander Ziel A. Solid State Physical Electronics. 1968;Prentice-Hall, Englewood Cliffs.