Dependence of exchange bias in Ni81Fe19/PtxMn1-x (0 < x < 0.2) bilayers on composition and microstructure

Journal of Magnetism and Magnetic Materials

Volumn 260, Issue 1-2, 2003, Pages 273-281

  Xi, Haiwen ^a,b   Bian, Bo ^a   Mountfield, Keith R ^a   Zhuang, Zailong ^a   Laughlin, David E ^a   White, Robert M ^a  

^a CARNEGIE MELLON UNIVERSITY   (United States)

^b SEAGATE TECHNOLOGY   (United States)

Author keywords

Biasing materials; Exchange bias; Ferromagnetic antiferromagnetic coupling; Magnetic thin film; PtMn

Indexed keywords

ANTIFERROMAGNETISM; FERROMAGNETISM; MAGNETIC ANISOTROPY; MAGNETIC COUPLINGS; MAGNETIC MOMENTS; MAGNETRON SPUTTERING;

EXCHANGE BIAS;

MAGNETIC THIN FILMS;

EID: 0037335416     PISSN: 03048853     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0304-8853(02)00585-1     Document Type: Article

References (28)

1. Hempstead R.D., Krongelb S., Thompson D.A. IEEE Trans. Magn. 14:1978;521.
2. Carey M., Berkowitz A.E. Appl. Phys. Lett. 60:1992;3060.
3. Lin T., Mauri D., Staud N., Hwang C., Howard J.K., Gorman G.L. Appl. Phys. Lett. 65:1994;1183.
4. Konoto M., Tsunoda M., Takahashi M. J. Appl. Phys. 85:1999;4925.
5. Nakatani R., Horoyuki H., Hoshino K., Sugita Y. J. Magn. Magn. Mater. 173:1997;321.
6. Soeya S., Hoshiya H., Fuyama M., Tadokoro S. J. Appl. Phys. 80:1996;1006.
7. Xi H., White R.M. J. Appl. Phys. 87:2000;410.
8. Araki S., Omata E., Sano M., Ohta M., Noguchi K., Morita H., Matsuzaki M. IEEE Trans. Magn. 34:1998;387.
9. Saito M., Kakaihara Y., Watanabe T., Hasegawa N. J. Magn. Soc. Japan. 21:1997;505.
10. Xi H., Bian B., Laughlin D.E., White R.M. J. Appl. Phys. 87:2000;4918.
11. Mauri D., Kay E., Scholl D., Howard J.K. J. Appl. Phys. 62:1987;2929.
12. A.J. Devasahayam, Biasing materials for anisotropic magnetoresistive and spin-valve heads, Ph.D. thesis, Carnegie Mellon University, Pittsburgh, 1998.
13. Xi H., White R.M. Phys. Rev. B. 61:2000;1318.
14. Néel L. Kurti N. Selected Works of Louis Néel. 1988;Gordon and Breach, New York.
15. Xi H., White R.M. Phys. Rev. B. 61:2000;80.
16. Soeya S., Nakamura S., Imagawa T., Narishige S. J. Appl. Phys. 77:1995;5838.
17. Ohring M. The Materials Science of Thin Films. 1992;Academic Press, San Diego.
18. Lederman M. IEEE Trans. Magn. 35:1999;794.
19. Tsang C., Lee K. J. Appl. Phys. 53:1982;2605.
20. Westwood W.D., Waterhouse N., Wilcox P.S. Tantalum Thin Films. 1975;Academic Press, London.
21. Krén E., Kádár G., Pál L., Sólyom J., Szabó P., Tarnóczi T. Phys. Rev. 171:1968;574.
22. Meneghetti D., Sidhu S.S. Phys. Rev. 105:1957;130.
23. Endoh Y., Ishikawa Y. J. Phys. Soc. Japan. 30:1971;1614.
24. Uchishiba H. J. Phys. Soc. Japan. 31:1971;436.
25. Honda N., Tanji Y., Nakagawa Y. J. Phys. Soc. Japan. 41:1976;1931.
26. Fuke H.N., Saito K., Yoshikawa M., Iwasaki H., Sahashi M. Appl. Phys. Lett. 75:1999;3680.
27. H. Xi, Study of exchange bias for magnetoelectronic sensors, Ph.D. dissertation, Carnegie Mellon University, Pittsburgh, 2001.
28. Stiles M.D., McMichael R.D. Phys. Rev. B. 59:1999;3722.