Characterization of PbSe1-xTex thin films

Journal of Physics and Chemistry of Solids

Volumn 64, Issue 3, 2003, Pages 367-376

  Kumar, Sushil ^a   Hussain, Muzammil ^a   Sharma, Thaneshwar P ^b   Husain, Mushahid ^a  

^a JAMIA MILLIA ISLAMIA CENTRAL UNIVERSITY   (India)

^b CH CHARAN SINGH UNIVERSITY   (India)

Author keywords

A. Alloys; A. Semiconductors; C. X ray diffraction

Indexed keywords

ACTIVATION ENERGY; BANDWIDTH; CHARACTERIZATION; ELECTRIC CONDUCTIVITY; FABRICATION; FOURIER TRANSFORMS; INFRARED SPECTROPHOTOMETERS; LEAD ALLOYS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTOR MATERIALS; THERMAL EFFECTS; X RAY DIFFRACTION;

POLYCRYSTALLINE THIN FILMS;

THIN FILMS;

EID: 0037334171     PISSN: 00223697     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3697(01)00252-9     Document Type: Article

References (37)

1. Maissel L.I., Glang R. Handbook of Thin Film Technology. 1970;McGraw Hill, New York.
2. Mathews J.W. Epitaxial Growth. 1975;Academic Press, New York.
3. Anderson J.C. The Use of Thin Films in Physical Investigations. 1966;Academic Press, New York.
4. Chopra K.L. Thin Film Phenomena. 1969;McGraw Hill, New York.
5. Kruger G. Thin Solid Films. 12:1972;335.
6. Ravich Yu.I., Effimova B.A., Smirnov I.A. Semiconducting Lead Chalcogenides. 1970;Plenum Press, New York.
7. Zemel J.N. Solid State Surface Science. 1:1969;291.
8. Proceedings of IEEE, 63 (1) 1975.
9. Hesse J., Prier J. Festkorperprobleme. 15:1975;229.
10. Zogg H., Fach A., John J., Masek J., Muller P., Paglino C., Buttler W. Optical Engineering. 33:1994;1440.
11. Preier H. Applied Physics. 20:1979;189.
12. Chaudhuri T.K. International Journal of Engineering Research. 16:1992;481.
13. Zemel J.N. Scott C.E. Surface Physics of Phosphors and Semiconductors. 1975;523-562 Academic Press, London.
14. Abbe S., Furukawa Y., Mochizuki K., Masumato K. Journal of the Japan Institute of Metals. 58:1994;346.
15. Lambrecht A., Kurbel R., Agne M. Materials Science and Engineering. 21:1993;217.
16. Agne M., Lambrecht A., Schiessl U., Tacke M. Infrared Physics and Technology. 35:1994;47.
17. Carter D.L., Bates R.T. The Physics of Semimetals and Narrow Gap Semiconductors. 1971;Pergamon, New York.
18. Fach A., John J., Muller P., Paglino C., Zogg H. Electronic Journal of Materials. 26:1997;873.
19. John J., Zogg H. Journal of Applied Physics. 85:1999;1.
20. Paglino C., Fach A., John J., Muller P., Zogg H. Journal of Applied Physics. 80:1996;7138.
21. Rogalski A. Infrared Photon Detectors. 1995;SPIE Optical Engineering Press, Bellinggham, WA.
22. Holloway H. Thin Film IV-VI Semiconductor Photodiodes. Physics of Thin Films. vol. 11:1980;Academic Press, New York. pp. 105-203.
23. Adamiec K., Rogalski A., Rutkowki J. Journal of Technical Physics. 38:1997;431.
24. Abkowitz M. Polymer Engineering Science. 24:1984;1149.
25. Rubin K.A., Chen M. Thin Solid Films. 181:1989;129.
26. Maeda Y., Andoh H., Ikuta I., Minemura H. Applied Optics. 64:1988;1715.
27. Gosain D.P., Shimizu T., Ohmura M., Suzuki M., Bando T., Okano S. Journal of Material Science. 26:1991;3271.
28. D.J. Gravesteiju, Applied Optics, 27 (188) 736.
29. Shokr E.K., Wakkad M.M. Journal of Material Science. 27:1992;1197.
30. Oe K., Toyoshima Y., Nagai H. Journal of Non-Crystalline Solids. 20:1976;405.
31. Pankove J.I. Optical Processes in Semiconductors. 1971;Prentice-Hall Inc, New Jersey.
32. Tauc J. Amorphous and Liquid Semiconductors. 1979;Plenum, New York.
33. Harman T.C., Melngailis I. Applied Solid State Science. 4:1974;1.
34. Espevick S., Chen-ho Wu, Bube R.H. Journal of Applied Physics. 42:1971;3513.
35. Briones F., Galmaya D., Ortiz C. Thin Solid Films. 78:1981;385.
36. Cullity B.D. Elements of X-ray Diffraction. 1959;Addison-Wesley Publishing Co, Massachusetts.
37. Bis R.F., Dixon J.R. Journal of Applied Physics. 40:1969;1918.