The effects of dilution gas and pressure on the properties of PE-CVD low-k film

Journal of the Electrochemical Society

Volumn 150, Issue 2, 2003, Pages

  Shioya, Yoshimi ^a   Kotake, Yuichiro ^b   Ishimaru, Tomomi ^b   Masubuchi, Tomoaki ^b   Ikakura, Hiroshi ^b   Ohgawara, Shouji ^b   Maeda, Kazuo ^a  

^a Semiconductor Process Laboratory   (Japan)

^b CANON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; ARGON; DEPOSITION; HELIUM; NITROGEN; PERMITTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THERMODYNAMIC STABILITY;

VAPOR PHASE REACTIONS;

DIELECTRIC FILMS;

EID: 0037326633     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1530154     Document Type: Article

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