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Volumn 27, Issue 2, 2003, Pages 145-152

Electrical characteristics of Si doped with Sb by laser annealing

Author keywords

Laser annealing; LID doping; Sb dopants; Silicon devices

Indexed keywords

ANTIMONY; DIFFUSION; ELECTRIC CONDUCTIVITY; LASER BEAM EFFECTS; MELTING; NEODYMIUM LASERS; PULSED LASER APPLICATIONS; SEMICONDUCTOR DOPING;

EID: 0037244365     PISSN: 13000101     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (2)

References (14)
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    • Lo, V.C.1    Wong, Y.W.2
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  • 9
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  • 13
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    • Laser and particle beam chemical processes on surface
    • Ed's A. Wayane, G. L. Loper and T. W. Singmon, "Boron Doping of Silicon Using Excimer Lasers"
    • A. Slaoui, F. Foulon, and M. Blanconi, "Laser and Particle Beam Chemical Processes on Surface", Ed's A. Wayane, G. L. Loper and T. W. Singmon, "Boron Doping of Silicon Using Excimer Lasers", Mat. Res. Soc. Symp. Proc., 129, (1989), 591.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.