메뉴 건너뛰기




Volumn 13, Issue 1, 2003, Pages 72-79

Electric spring modeling for a comb actuator deformed by the footing effect in deep reactive ion etching

Author keywords

[No Author keywords available]

Indexed keywords

DYNAMIC RESPONSE; ELECTRIC POTENTIAL; ELECTRODES; REACTIVE ION ETCHING; RESONANCE;

EID: 0037233776     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/13/1/311     Document Type: Article
Times cited : (12)

References (9)
  • 2
    • 0002662639 scopus 로고    scopus 로고
    • Multiple depth, single crystal silicon microActuators for large displacement fabricated by deep reactive ion etching
    • (Hilton Head)
    • Lee Chris Seung-Bok, Han Sejin and MacDonald Noel C 1998 Multiple depth, single crystal silicon microActuators for large displacement fabricated by deep reactive ion etching Proc. Solid-State Sensor and Actuator Workshop (Hilton Head) pp 45-50
    • (1998) Proc. Solid-State Sensor and Actuator Workshop , pp. 45-50
    • Lee Chris, S.-B.1    Han, S.2    Macdonald Noel, C.3
  • 3
    • 0036466335 scopus 로고    scopus 로고
    • Micro XY-stage using silicon on a glass substrate
    • Kim Che-Heung and Kim Yong-Kweon 2002 Micro XY-stage using silicon on a glass substrate J. Micromech. Microeng. 12 103-7
    • (2002) J. Micromech. Microeng. , vol.12 , pp. 103-107
    • Kim, C.-H.1    Kim, Y.-K.2
  • 4
    • 0003380730 scopus 로고    scopus 로고
    • A bulk-micromachined single crystal silicon gyroscope operating at atmospheric pressure
    • (Munich: Germany)
    • Kim Seong-Hyok, Lee June-Young, Kim Che-Heung and Kim Yong-Kweon 2001 A bulk-micromachined single crystal silicon gyroscope operating at atmospheric pressure Transducers '01 (Munich: Germany) pp 476-9
    • (2001) Transducers '01 , pp. 476-479
    • Kim, S.-H.1    Lee, J.-Y.2    Kim, C.-H.3    Kim, Y.-K.4
  • 5
    • 0000120994 scopus 로고    scopus 로고
    • Notching as an example of charging in uniform high density plasmas
    • Kinoshita Takashi, Hane Masami and McVittie James P 1996 Notching as an example of charging in uniform high density plasmas J. Vac. Sci. Technol. B 14 560-5
    • (1996) J. Vac. Sci. Technol. B , vol.14 , pp. 560-565
    • Kinoshita, T.1    Hane, M.2    McVittie, J.P.3
  • 7
    • 0032753082 scopus 로고    scopus 로고
    • Characterization of a time multiplexed inductively coupled plasma etcher
    • Ayon A A, Braff R, Lin C C and Schmidt M A 1999 Characterization of a time multiplexed inductively coupled plasma etcher J. Electrochem. Soc. 146 339-49
    • (1999) J. Electrochem. Soc. , vol.146 , pp. 339-349
    • Ayon, A.A.1    Braff, R.2    Lin, C.C.3    Schmidt, M.A.4
  • 9


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.