Adaptive run-to-run control and monitoring for a rapid thermal processor

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 1 SPEC., 2003, Pages 301-310

  Qin, S Joe ^a   Scheid, Glen W ^b   Riley, Terrence J ^c  

^a The University of Texas at Austin   (United States)

^b AGERE SYSTEMS   (United States)

^c ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL EQUIPMENT; LASER BEAMS; LASER PULSES; SHRINKAGE; SILICON WAFERS; THERMAL GRADIENTS;

INTERMITTENT BATCH OPERATIONS; RUN TO RUN CONTROLLER; SELF MONITORING COMPONENT;

RAPID THERMAL ANNEALING;

EID: 0037207725     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1539068     Document Type: Article

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