Thermal and structural deformation and its impact on optical performance of projection optics for extreme ultraviolet lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue , 2003, Pages 127-129

  Li, Yanqiu ^a   Ota, Kazuya ^a   Murakami, Katsuhiko ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; FINITE ELEMENT METHOD; LIGHT ABSORPTION; MIRRORS; OPTICAL COATINGS; OPTICAL DESIGN; OPTICAL MULTILAYERS; OPTICS; PHOTORESISTS; PROJECTION SYSTEMS;

EXTREME ULTRAVIOLET LITHOGRAPHY; PROJECTION OPTICS; STRUCTURAL DEFORMATION; THERMAL DEFORMATION;

PHOTOLITHOGRAPHY;

EID: 0037207703     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1534573     Document Type: Article

References (5)

1. International Technology Roadmap for Semiconductors 2000 Update, Lithography.
2. C. J. Martin, R. L. Engelstadt, and E. G. Lovell, Proc. SPIE 4343, 515 (2001).
3. A. K. Ray-Chaudhuri, S. E. Gianoulakis, P. A. Spence, M. P. Kanouff, and C. D. Moen, Proc. SPIE 3331, 124 (1998).
4. C. Gwyn, "Extreme Ultraviolet Lithography White Paper," Ultraviolet Limited Liability Company (EUV LLC), Livermore, CA (1999), p. 78.
5. N. Harned, "SVGL EUVL Program Update," Second International Workshop on EUV Lithography, 2000, Japan (unpublished).