Characteristics of ZnO/Si prepared by Zn 3 P 2 diffusion

Applied Surface Science

Volumn 202, Issue 3-4, 2002, Pages 266-271

  Ko, Young Don ^a   Jung, Jihoun ^a   Bang, Kyu Hyun ^a   Park, Min Chul ^a   Huh, Kwang Soo ^a   Myoung, Jae Min ^a   Yun, Ilgu ^a  

^a Yonsei University   (South Korea)

Author keywords

Diffusion; Doping; II VI semiconductor; Rf magnetron sputtering; Si

Indexed keywords

MAGNETRON SPUTTERING; SEMICONDUCTING FILMS; SEMICONDUCTOR DOPING; SUBSTRATES; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

CLOSED AMPOULE TECHNIQUE;

DIFFUSION IN SOLIDS;

EID: 0037203069     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(02)00949-2     Document Type: Article

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