High throughput materials research and development: A growing effort at NIST

Applied Surface Science

Volumn 189, Issue 3-4, 2002, Pages 196-204

  Hewes, John D ^a   Bendersky, Leonid A ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Combinatorial methods; High throughput screening

Indexed keywords

AMORPHOUS MATERIALS; EPITAXIAL GROWTH; HIGH RESOLUTION ELECTRON MICROSCOPY; INTERFACES (MATERIALS); METALLIZING; MICROSTRUCTURE; MULTILAYERS; OPTIMIZATION; ORGANIC POLYMERS; PEROVSKITE; RESEARCH AND DEVELOPMENT MANAGEMENT; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

COMBINATORIAL METHODS;

MATERIALS SCIENCE;

EID: 0037188093     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)01005-4     Document Type: Conference Paper

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