Characterization of MgO thin films grown by rf-sputtering

Vacuum

Volumn 67, Issue 3-4, 2002, Pages 577-581

  Caceres D ^a   Colera, I ^a   Vergara, I ^a   Gonzalez R ^a   Roman E ^b  

^a UNIVERSIDAD CARLOS III DE MADRID   (Spain)

^b INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

Author keywords

Auger electron spectroscopy; MgO thin films; Sputtering; X ray diffraction; X ray photoelectron spectroscopy

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CRYSTALLINE MATERIALS; FILM GROWTH; MAGNESIA; SPUTTERING; STOICHIOMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

THIN FILM GROWTH;

THIN FILMS;

EID: 0037179733     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00251-8     Document Type: Conference Paper

References (25)

1. MacLean S.G., Duley W.W. J Phys Chem Solids. 45:1984;223-225.
2. Vuoristo P., Mäntylä T., Kettunen P. J Vac Sci Technol. A4:1986;2932-2937.
3. Fork D.K., Ponce F.A., Tamontana J.C., Geballe T.H. Appl Phys Lett. 58:1991;2294-2296.
4. Yi W., Yu S., Lee W., Han T., Jeong T., Woo Y., Lee J., Jin S., Choi W., Heo J., Jeon D., Kim J.M. J Appl Phys. 89:2001;4091-4095.
5. Lee J., Jeon T., Yu S., Jin S., Heo J., Yi W., Jeon D., Kim J.M. Appl Surf Sci. 174:2001;62-69.
6. Shoji A., Aoyagi M., Kosaka S., Shinoki F., Hayakawa H. Appl Phys Lett. 46:1985;1098-1100.
7. Thakoor S., Leduc H.G., Stern J.A., Thakoor A.P., Khanna S.K. J Vac Sci Technol. A5:1987;1721-1725.
8. Tonouchi M., Sakaguchi Y., Kobayashi T. J Appl Phys. 62:1987;961-966.
9. Maruyama T., Shionoya J. Jpn J Appl Phys. 29:1990;L810-L811.
10. Corneille J.S., He J.W., Goodman D.W. Surf Sci. 306:1994;269-278.
11. Lee S.M., Murakami H., Ito T. Appl Surf Sci. 175-176:2001;517-524.
12. Tarsa E.J., De Graef M., Clarke D.R., Gossard A.C., Speck J.S. J Appl Phys. 73:1993;3276-3283.
13. Chen X.Y., Yang B., Liu Z.G., Shi L.J. Appl Surf Sci. 135:1998;233-237.
14. Dong L., Zepeda-Ruiz L.A., Srolovitz D.J. J Appl Phys. 89:2001;4105-4112.
15. Hsu W.Y., Raj R. Appl Phys Lett. 60:1992;3105-3107.
16. Pinto R., Poothra S.C., Purandare S.P., Pai S.P., D'Souza C.P., Kumar D., Sharon M. J Vac Sci Technol. A9:1991;2670-2674.
17. Misaki Y., Mikawa M., Ishiguro T., Hamasaki K. J Vac Sci Technol. A15:1997;48-51.
18. Henrich V.E. Rep Prog Phys. 48:1985;1481-1541.
19. Powder Diffraction File Database. International Centre for Diffraction Data (ICDD), 1995.
20. Cullity BD. Elements of X-ray diffraction. Reading, MA: Addison-Wesley, 1978. p. 102.
21. Wasa K, Hayakawa S. Handbook of sputter deposition technology. New Jersey: Noyes Publications, 1992. p. 49.
22. Davis L.E., MacDonald N.C., Palmberg P.W., Riach G.E., Weber R.E. Handbook of auger electron spectroscopy. 1976;Physical Electronics Industries, Inc. Minnesota.
23. Colera I., González R., Soria E., de Segovia J.L., Román E.L., Chen Y. J Vac Sci Technol. A15:1997;1698-1703.
24. Peng X.D., Barteau M.A. Surf Sci. 233:1990;283-292.
25. Liu P., Kendelewicz T., Brown G.E. Jr., Parks A. Surf Sci. 412/413:1998;287-314.