Reaction mechanism of chlorosiloxane ring formation from SiCl4 and O2

Journal of Physical Chemistry A

Volumn 106, Issue 29, 2002, Pages 6802-6809

  Kumar, Anil ^a   Homann, Thorsten ^a   Jug, Karl ^a  

^a LEIBNIZ UNIVERSITY HANNOVER   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHLOROSILOXANE RINGS;

OXYGEN; PROBABILITY DENSITY FUNCTION; REACTION KINETICS; SILICON COMPOUNDS;

CHLORINE COMPOUNDS;

EID: 0037173863     PISSN: 10895639     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp014235o     Document Type: Article

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